JPH0564449B2 - - Google Patents

Info

Publication number
JPH0564449B2
JPH0564449B2 JP59041326A JP4132684A JPH0564449B2 JP H0564449 B2 JPH0564449 B2 JP H0564449B2 JP 59041326 A JP59041326 A JP 59041326A JP 4132684 A JP4132684 A JP 4132684A JP H0564449 B2 JPH0564449 B2 JP H0564449B2
Authority
JP
Japan
Prior art keywords
reticle
thickness
mask
optical
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59041326A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60186842A (ja
Inventor
Shunzo Imai
Ichiro Ishama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59041326A priority Critical patent/JPS60186842A/ja
Priority to US06/707,235 priority patent/US4630922A/en
Publication of JPS60186842A publication Critical patent/JPS60186842A/ja
Publication of JPH0564449B2 publication Critical patent/JPH0564449B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59041326A 1984-03-06 1984-03-06 露光装置 Granted JPS60186842A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59041326A JPS60186842A (ja) 1984-03-06 1984-03-06 露光装置
US06/707,235 US4630922A (en) 1984-03-06 1985-03-01 Pattern transfer apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59041326A JPS60186842A (ja) 1984-03-06 1984-03-06 露光装置

Publications (2)

Publication Number Publication Date
JPS60186842A JPS60186842A (ja) 1985-09-24
JPH0564449B2 true JPH0564449B2 (en]) 1993-09-14

Family

ID=12605395

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59041326A Granted JPS60186842A (ja) 1984-03-06 1984-03-06 露光装置

Country Status (2)

Country Link
US (1) US4630922A (en])
JP (1) JPS60186842A (en])

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3037040B2 (ja) * 1993-01-20 2000-04-24 日本電気株式会社 露光装置
JP3221226B2 (ja) * 1994-03-30 2001-10-22 キヤノン株式会社 照明装置及びそれを用いた投影露光装置
EP1396761A3 (en) * 2002-08-29 2008-12-10 ASML Netherlands B.V. An alignment tool, a lithographic apparatus, an alignment method and a device manufacturing method
EP1394616A1 (en) * 2002-08-29 2004-03-03 ASML Netherlands BV An alignment tool, a lithographic apparatus, an alignment method and a device manufacturing method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54114182A (en) * 1978-02-27 1979-09-06 Canon Inc Alingment device
JPS56110234A (en) * 1980-02-06 1981-09-01 Canon Inc Projection printing device
JPS58179834A (ja) * 1982-04-14 1983-10-21 Canon Inc 投影露光装置及び方法

Also Published As

Publication number Publication date
US4630922A (en) 1986-12-23
JPS60186842A (ja) 1985-09-24

Similar Documents

Publication Publication Date Title
US4492459A (en) Projection printing apparatus for printing a photomask
US8159649B2 (en) Exposure method, exposure apparatus, photomask and method for manufacturing photomask
KR101009793B1 (ko) 플라이 아이 렌즈, 조명 광학 장치, 노광 장치 및 노광 방법
CA1095760A (en) Achromatic unit magnification optical system
TW480347B (en) Microlithographic reduction objective, projection exposure equipment and process
US7450312B2 (en) Optical projection lens system
KR970060356A (ko) 패턴형성방법, 투영노출장치 및 반도체장치의 제조방법
JP5071382B2 (ja) 走査露光装置及びマイクロデバイスの製造方法
US6344892B1 (en) Exposure apparatus and device manufacturing method using same
JP4366948B2 (ja) 照明光学装置、露光装置および露光方法
US4616130A (en) Projection exposure apparatus
JPH0721583B2 (ja) 露光装置
JPH0564449B2 (en])
JPH04133414A (ja) 縮小投影露光装置
JP2003203853A (ja) 露光装置及び方法並びにマイクロデバイスの製造方法
JPH04225358A (ja) 投影露光装置及び方法、並びに素子製造方法
JP3296296B2 (ja) 露光方法及び露光装置
KR20010007452A (ko) 노광방법, 노광장치 및 반도체디바이스의 제조방법
JP2901201B2 (ja) フォトマスク
JP5093759B2 (ja) 変位検出装置、露光装置、およびデバイス製造方法
JPH05217839A (ja) 投影露光装置
JP2656204B2 (ja) マスク交換装置
JP2000058422A (ja) 露光装置
KR102731783B1 (ko) 노광 장치, 및 물품제조 방법
JPH05326365A (ja) 投影露光装置